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Attachment 3

Lithography for robust and editable atomic-scale silicon devices and memories, Achal, R., Rashidi, M., Croshaw, J., Churchill, D., Taucer, M., Huff, T., Cloutier, M., Pitters, J.L., Wolkow, R.A., Nature Communications, 9, 2778, (July 23, 2018)